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M27_PI
 
 
M27_PI M27_SII-Ha-OIII-(Hubble_Palette)_Test M27_SII+Ha-Ha-OIII_Test

M27_PI

Exposure
- Ha - 6x15-minute sub exposures
- OIII - 6x15-minute sub exposures
- 3 hours total exposure

Equipment Used
- Takahashi TOA-150
- SBIG STL-11000M
- Paramount ME
- Astrodon 5nm Ha
- Astrodon 3nm OIII

Registered and stacked in CCDStack
Processed in PixInsight

100% Center crop

Date: 07/10/2009
 
 
 

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M27

1. M27_PI 2. M27_SII-Ha-... 3. M27_SII+Ha-...

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TOA150_Incorrect Spacers 3D plot

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